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Fabrication of Diamond-Like Carbon Emitter Patterns by Room-Temperature Curing Nanoimprint Lithography with PDMS Molds Using Polysiloxane

Published online by Cambridge University Press:  26 January 2016

Shuji Kiyohara ,
Shogo Yoshida ,
Ippei Ishikawa ,
Toru Harigai ,
Hirofumi Takikawa ,
Masahiko Watanabe ,
Yoshinari Sugiyama ,
Yukiko Omata  and
Yuichi Kurashima
Shuji Kiyohara
Affiliation:
Electric and Electron System Engineering Course, Department of Multidisciplinary Engineering, Faculty of Advanced Engineering, National Institute of Technology, Maizuru College, 234 Aza Shiroya, Maizuru, Kyoto 625-8511, Japan
Shogo Yoshida*
Affiliation:
Electric and Electron System Engineering Course, Department of Multidisciplinary Engineering, Faculty of Advanced Engineering, National Institute of Technology, Maizuru College, 234 Aza Shiroya, Maizuru, Kyoto 625-8511, Japan
Ippei Ishikawa
Affiliation:
Electric and Electron System Engineering Course, Department of Multidisciplinary Engineering, Faculty of Advanced Engineering, National Institute of Technology, Maizuru College, 234 Aza Shiroya, Maizuru, Kyoto 625-8511, Japan
Toru Harigai
Affiliation:
Department of Electrical and Electronic Information Engineering, Toyohashi University of Technology, 1-1 Hibarigaoka Tempaku, Toyohashi, Aichi 441-8580, Japan
Hirofumi Takikawa
Affiliation:
Department of Electrical and Electronic Information Engineering, Toyohashi University of Technology, 1-1 Hibarigaoka Tempaku, Toyohashi, Aichi 441-8580, Japan
Masahiko Watanabe
Affiliation:
Application and Technical Section, ELIONIX INC., 3-7-6 Motoyokoyama, Hachioji, Tokyo 192-0063, Japan
Yoshinari Sugiyama
Affiliation:
Application and Technical Section, ELIONIX INC., 3-7-6 Motoyokoyama, Hachioji, Tokyo 192-0063, Japan
Yukiko Omata
Affiliation:
Application and Technical Section, ELIONIX INC., 3-7-6 Motoyokoyama, Hachioji, Tokyo 192-0063, Japan
Yuichi Kurashima
Affiliation:
Research Center for Ubiquitous MEMS and Micro Engineering, National Institute of Advanced Industrial Science and Technology, 1-2-1 Namiki, Tsukuba, Ibaraki 305-8564, Japan
*
*(Email: a0344@g.maizuru-ct.ac.jp)
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Abstract

We investigated the fabrication of diamond-like carbon (DLC) emitter patterns by room-temperature curing nanoimprint lithography (RTC-NIL) with polydimethylsiloxane (PDMS) molds using polysiloxane, as an application to the emitter for the next generation flat panel display.

The DLC which has excellent properties similar to diamond properties was used as a pattern material. A PDMS was used as a mold material and fabricated by the following optimum conditions of the first curing time at RT for 36 h and the second curing time at the temperature of 150 °C for 15 mins. The polysiloxane is in the state of sticky liquid at RT and stable in air. Therefore, the polysiloxane was used the electron beam (EB) resist and oxide mask material in EB lithography, and also used as RT-imprint material.

First, we fabricated the PDMS mold with pit array. Each dot is 5 µm-diameter and 400 nm-depth. We carried out the RTC-NIL process with PDMS molds using polysiloxane under the following optimum imprint conditions of 0.5 MPa-imprinting pressure, 1.5 min-the time between spin-coat and imprint, and 5 min-imprinting time. Next, the residual layer of imprinted polysiloxane pattern was 450 nm and then was removed with electron cyclotron resonance (ECR) trifluoromethane (CHF3) ion shower under the conditions of 300 eV-ion energy and 3 min-etching time. Then, we processed the imprinted polysiloxane patterns on the DLC film with an ECR oxygen (O2) ion shower under the conditions of 400 eV-ion energy and 12 min-etching time. As a result, we succeeded in fabricating convex DLC emitter patterns with high accuracy which has 5 µm-diameter and 500 nm-height.

Keywords

diamondmicrostructurereactive ion etching
Type
Articles
Information
MRS Advances , Volume 1 , Issue 16: Electronics and Photonics , 2016 , pp. 1075 - 1080
Copyright
Copyright © Materials Research Society 2016 

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References

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