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Ultra High Energy Resolution EELS Mapping using Aberration-corrected Low-voltage STEM Equipped with Monochromator

Published online by Cambridge University Press:  25 July 2016

Masaki Mukai
Affiliation:
JEOL Ltd., 3-1-2 Musashino, Akishima, Tokyo 196-8558, Japan
Shigeyuki Morishita
Affiliation:
JEOL Ltd., 3-1-2 Musashino, Akishima, Tokyo 196-8558, Japan
Hidetaka Sawada
Affiliation:
JEOL Ltd., 3-1-2 Musashino, Akishima, Tokyo 196-8558, Japan
Kazu Suenaga
Affiliation:
Nanotube Research Center, National Institute of Advanced Industrial Science and Technology (AIST), Central 5, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan

Abstract

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Type
Abstract
Copyright
© Microscopy Society of America 2016 

References

[1] Mukai, M., et al., Ultramicroscopy 140 (2014) 3743.CrossRefGoogle Scholar
[2] Sawada, H., et al., J. Electron Microsc 58 (2009) 341347.CrossRefGoogle Scholar
[3] This work is supported by JST, Research Acceleration Program (2012-2016).Google Scholar