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Total Electron Yield Mapping of Electronic Device Features via Measurement of X-Ray Beam-Induced Currents

Published online by Cambridge University Press:  05 August 2019

William A. Hubbard
Affiliation:
Department of Physics & Astronomy and California NanoSystems Institute, University of California, Los Angeles, CA, USA.
Jared J. Lodico
Affiliation:
Department of Physics & Astronomy and California NanoSystems Institute, University of California, Los Angeles, CA, USA.
Brian Zutter
Affiliation:
Department of Physics & Astronomy and California NanoSystems Institute, University of California, Los Angeles, CA, USA.
David Shapiro
Affiliation:
Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, CA, USA.
Yuan Hung Lo
Affiliation:
Department of Physics & Astronomy and California NanoSystems Institute, University of California, Los Angeles, CA, USA. Department of Bioengineering, University of California, Los Angeles, CA, USA.
Arjun Rana
Affiliation:
Department of Physics & Astronomy and California NanoSystems Institute, University of California, Los Angeles, CA, USA.
Drew Morrill
Affiliation:
Department of Physics and JILA, University of Colorado and NIST, Boulder, CO, USA.
Christian Gentry
Affiliation:
Department of Physics and JILA, University of Colorado and NIST, Boulder, CO, USA.
Ho Leung Chan
Affiliation:
Department of Physics & Astronomy and California NanoSystems Institute, University of California, Los Angeles, CA, USA.
B. C. Regan
Affiliation:
Department of Physics & Astronomy and California NanoSystems Institute, University of California, Los Angeles, CA, USA.
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Abstract

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Type
Low-Energy X-Ray Analysis: Novel Applications Using Soft X-Ray Emission Spectroscopy (SXES), Cathodoluminescence (CL), and Synchrotron Techniques
Copyright
Copyright © Microscopy Society of America 2019 

References

[1]Vyvenko, OF et al. , Journal of Applied Physics, 91 (2002), p. 36143617.CrossRefGoogle Scholar
[2]Nolle, D et al. , Microscopy and Microanalysis, 17 (2011), p. 834842.CrossRefGoogle Scholar
[3]Hubbard, WA et al. , Physical Review Applied, 10 (2018), 044066.CrossRefGoogle Scholar
[4]Koehl, A et al. , APL Materials, 1 (2013), p. 042102.CrossRefGoogle Scholar
[5]Bernstein, DP et al. , Physical Review B, 83 (2011), p. 180410.CrossRefGoogle Scholar
[6]This work has been supported by National Science Foundation STC award DMR-1548924 (STROBE) and by the UCLA PSEIF. The authors acknowledge the use of instruments at the EICN supported by NIH 1S10RR23057 and the CNSI at UCLA, and the COSMIC beamline at Lawrence Berkeley National Laboratory, supported by the U.S. Department of Energy under contract number DE-AC02-05CH11231.Google Scholar
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Total Electron Yield Mapping of Electronic Device Features via Measurement of X-Ray Beam-Induced Currents
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