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Thermal Stability of Hf-Based Gate Dielectric Stacks with Rare-Earth Oxide Capping Layers

Published online by Cambridge University Press:  03 August 2008

JM LeBeau ,
JS Jur ,
DJ Lichtenwalner ,
AI Kingon ,
DO Klenov  and
S Stemmer
JM LeBeau
Affiliation:
University of California Santa Barbara
JS Jur
Affiliation:
North Carolina State University
DJ Lichtenwalner
Affiliation:
North Carolina State University
AI Kingon
Affiliation:
North Carolina State University
DO Klenov
Affiliation:
FEI Company
S Stemmer
Affiliation:
University of California Santa Barbara
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Extract

Extended abstract of a paper presented at Microscopy and Microanalysis 2008 in Albuquerque, New Mexico, USA, August 3 – August 7, 2008

Type
Research Article
Information
Microscopy and Microanalysis , Volume 14 , Supplement S2 , August 2008 , pp. 418 - 419
Copyright
© 2008 Microscopy Society of America

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