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Study on the Atomic and Electronic Structure in CrN (VN, TiN) Films using CS-Corrected TEM

Published online by Cambridge University Press:  23 September 2015

Zaoli Zhang  and
Gerhard Dehm
Zaoli Zhang*
Affiliation:
Erich Schmid Institute, Austrian Academy of Sciences, Leoben, Austria
Gerhard Dehm
Affiliation:
Max-Planck-Institut fur Eisenforschung, Dusseldorf, Germany
*
*Email: zaoli.zhang@oeaw.ac.at

Abstract

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Information
Microscopy and Microanalysis , Volume 21 , Supplement S3: Proceedings of Microscopy & Microanalysis 2015 , August 2015 , pp. 2079 - 2080
Copyright
Copyright © Microscopy Society of America 2015 

References

[1] Daniel, R., et al, Acta Materialia 58 (2010). p. 2621.Google Scholar
[2] Zhang, Z. L., et al, Physical. Review B 82(r (2010). p 060103–060104.Google Scholar
[3] Zhang, Z. L., et al, Journal of Applied Physics 110 (2011). p 043524–4.Google Scholar
[4] Zhang, Z.L., et al, Physical Review B 87 (2013). p 014104.Google Scholar
[5] Harzer, T.P., etal, Thin Solid Films 545 (2013). p 154–160.Google Scholar
[6] Botana, A.S., et al, Physical Review B 85 (2012). p. 235118.CrossRefGoogle Scholar
[7] Acknowledgement: Gabriele Moser and Herwig Felber are gratefully acknowledged for their help with sample preparation, thanks are given to Dr.Hong Li for ab-initio calculations. Thank Dr. Rostislav Daniel and Christian Mitterer in Montanuniversitat Leoben, Leoben, Austria for delivering the materials..Google Scholar