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Study of Tantalum impurity in HfO2 based on DFT

Published online by Cambridge University Press:  05 August 2007

Y Mino
Affiliation:
Samsung Advanced Institute of Technology,Korea
B HionSuck
Affiliation:
Samsung Advanced Institute of Technology,Korea
L Eunha
Affiliation:
Samsung Advanced Institute of Technology,Korea
P JongBong
Affiliation:
Samsung Advanced Institute of Technology,Korea
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Extract

Extended abstract of a paper presented at Microscopy and Microanalysis 2007 in Ft. Lauderdale, Florida, USA, August 5 – August 9, 2007

Type
Research Article
Copyright
© 2007 Microscopy Society of America

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