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STEM-EDXS System for Atomic-Sensitivity Elemental Mapping

Published online by Cambridge University Press:  23 September 2015

T.C. Lovejoy
Affiliation:
Nion Co., 11511 NE 118th St. Kirkland, WA 98034, USA
R.M. Stroud
Affiliation:
Materials Sci. and Tech. Division, Naval Research Laboratory, Washington, DC 20375, USA
N.D. Bassim
Affiliation:
Materials Sci. and Tech. Division, Naval Research Laboratory, Washington, DC 20375, USA
G.J. Corbin
Affiliation:
Nion Co., 11511 NE 118th St. Kirkland, WA 98034, USA
N. Dellby
Affiliation:
Nion Co., 11511 NE 118th St. Kirkland, WA 98034, USA
W. Hahn
Affiliation:
Bruker Nano GmbH, Am Studio 2D, 12489 Berlin, Germany
P. Hrncirik
Affiliation:
Nion Co., 11511 NE 118th St. Kirkland, WA 98034, USA
M. Falke
Affiliation:
Bruker Nano GmbH, Am Studio 2D, 12489 Berlin, Germany
A. Kaeppel
Affiliation:
Bruker Nano GmbH, Am Studio 2D, 12489 Berlin, Germany
M. Rohde
Affiliation:
Bruker Nano GmbH, Am Studio 2D, 12489 Berlin, Germany
O.L. Krivanek
Affiliation:
Nion Co., 11511 NE 118th St. Kirkland, WA 98034, USA
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Abstract

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Copyright
Copyright © Microscopy Society of America 2015 

References

1 Lovejoy, T.C., et al.., Appl. Phys. Lett. 100, 154101 (2012).CrossRefGoogle Scholar
2 Stroud, R.M., et al., (this meeting).Google Scholar
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