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Rigorous Quantitative SEM/EDS Microanalysis Requires Careful Inspection of the Peak-Fitting Residual Spectrum to Reveal Hidden Constituents

Published online by Cambridge University Press:  25 July 2016

Dale E. Newbury  and
Nicholas W. M. Ritchie
Dale E. Newbury
Affiliation:
National Institute of Standards and Technology, Gaithersburg, MD
Nicholas W. M. Ritchie
Affiliation:
National Institute of Standards and Technology, Gaithersburg, MD

Abstract

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Abstract
Information
Microscopy and Microanalysis , Volume 22 , Supplement S3: Proceedings of Microscopy & Microanalysis 2016 , July 2016 , pp. 396 - 397
Copyright
© Microscopy Society of America 2016 

References

[1] Newbury, D. & Ritchie, N. J. Materials Sci 50 (2015) 493–518.Google Scholar
[2] Ritchie, N. DTSA-II available free at: www.cstl.nist.gov/div837/837.02/epq/dtsa2/index.html.Google Scholar