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Practical Considerations in Quantitative Nanoscale Energy-Dispersive X-ray Spectroscopy (EDX) and Its Application in SiGe

Published online by Cambridge University Press:  23 September 2015

Weihao Weng*
Affiliation:
IBM Microelectronics Division, Zip 40E, 2070 Route 52, Hopewell Junction, NY 12533, USA
Frieder H. Baumann
Affiliation:
IBM Microelectronics Division, Zip 40E, 2070 Route 52, Hopewell Junction, NY 12533, USA
Yue Ke
Affiliation:
IBM Microelectronics Division, Zip 40E, 2070 Route 52, Hopewell Junction, NY 12533, USA
Rainer Loesing
Affiliation:
IBM Microelectronics Division, Zip 40E, 2070 Route 52, Hopewell Junction, NY 12533, USA
Anita Madan
Affiliation:
IBM Microelectronics Division, Zip 40E, 2070 Route 52, Hopewell Junction, NY 12533, USA
Zhengmao Zhu
Affiliation:
IBM Microelectronics Division, Zip 40E, 2070 Route 52, Hopewell Junction, NY 12533, USA
Ahmad D. Katnani
Affiliation:
IBM Microelectronics Division, Zip 40E, 2070 Route 52, Hopewell Junction, NY 12533, USA
*
*Email: TEL : +1-845-894-5944wweng@us.ibm.com
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Abstract

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Copyright © Microscopy Society of America 2015 

References

[1] Spence, J.C.H., et al, J. Microsc. 130 (1983). p. 147.CrossRefGoogle Scholar
[2] Hubner, R., et al, Thin Solid Films 519 (2010). p. 203.CrossRefGoogle Scholar
[3] Lin, C.H., et al, , IEDM ( (2014.Google Scholar
[4] Liao, Y., et al, Ultramicroscopy 126 (2013). p. 19.CrossRefGoogle Scholar
[5] Acknowledgements: The authors thank John Bruley (IBM), Yun-Yu Wang (IBM), Jinghong Li (IBM), Alexandre Pofelski (STMicroelectronics) and Germain Servanton (STMicroelectronics) for valuable discussions..Google Scholar
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