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Phase-residue Removal Based on Sparse Modeling in Electron Holography

Published online by Cambridge University Press:  22 July 2022

Yoshio Takahashi ,
Tetsuya Akashi  and
Toshiaki Tanigaki
Yoshio Takahashi*
Affiliation:
Research and Development Group, Hitachi, Ltd., Hatoyama, Saitama, Japan
Tetsuya Akashi
Affiliation:
Research and Development Group, Hitachi, Ltd., Hatoyama, Saitama, Japan
Toshiaki Tanigaki
Affiliation:
Research and Development Group, Hitachi, Ltd., Hatoyama, Saitama, Japan
*
*Corresponding author: yoshio.takahashi.jc@hitachi.com

Abstract

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Type
Artificial Intelligence, Instrument Automation, And High-dimensional Data Analytics for Microscopy and Microanalysis
Information
Microscopy and Microanalysis , Volume 28 , Supplement S1 , August 2022 , pp. 3004 - 3005
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Copyright
Copyright © Microscopy Society of America 2022

References

Takahashi, Y. et al. , Microsc. Microanal. 27 (Suppl. 1) (2021) 2308.10.1017/S1431927621008308CrossRefGoogle Scholar
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Anada, S. et al. , Ultramicroscopy 206 (2019) 112818.10.1016/j.ultramic.2019.112818CrossRefGoogle Scholar
Akashi, T. et al. , Appl. Phys. Lett. 106 (2015) 074101.10.1063/1.4908175CrossRefGoogle Scholar
This work was supported by Innovative Science and Technology Initiative for Security Grant Number JPJ004596, ATLA, Japan.Google Scholar