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Nanoscale Strain Mapping in Embedded SiGe Devices by Dual Lens Dark Field Electron Holography and Precession Electron Diffraction

Published online by Cambridge University Press:  23 September 2015

Y. Y. Wang ,
D. Cooper ,
J. Rouviere ,
C.E. Murray ,
N. Bernier  and
J. Bruley
Y. Y. Wang
Affiliation:
IBM Micro-electronics division, 2070 Route 52, Hopewell Junction, NY 12570, USA
D. Cooper
Affiliation:
CEA, LETI, MINATEC Campus, 17 rue des Martyrs, 38054 Grenoble Cedex 9, France
J. Rouviere
Affiliation:
CEA, INAC, MINETEC Campus, 17 rue des Martyrs, 38054 Grenoble Cedex 9, France
C.E. Murray
Affiliation:
IBM T. J. Watson Research Center, 1101 Kitchawan Road, Route 134, Yorktown Heights, NY 10598, USA
N. Bernier
Affiliation:
CEA, LETI, MINATEC Campus, 17 rue des Martyrs, 38054 Grenoble Cedex 9, France
J. Bruley
Affiliation:
IBM T. J. Watson Research Center, 1101 Kitchawan Road, Route 134, Yorktown Heights, NY 10598, USA

Abstract

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Abstract
Information
Microscopy and Microanalysis , Volume 21 , Supplement S3: Proceedings of Microscopy & Microanalysis 2015 , August 2015 , pp. 1963 - 1964
Copyright
Copyright © Microscopy Society of America 2015 

References

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