Hostname: page-component-848d4c4894-cjp7w Total loading time: 0 Render date: 2024-06-17T23:47:01.168Z Has data issue: false hasContentIssue false
  • English
  • Français

Microstructural Analysis of Si Frameworks Induced by Electrochemical (De)Alloying Process

Published online by Cambridge University Press:  01 August 2018

Dong-Su Ko ,
Ken Ogata ,
Sungho Jeon ,
Changhoon Jung ,
Junho Lee ,
Soohwan Sul ,
Hee-Goo Kim  and
Jai Kwang Shin
Dong-Su Ko
Affiliation:
Platform Technology Lab, Samsung Advanced Institute of Technology, Suwon, Republic of Korea
Ken Ogata
Affiliation:
Samsung Research Institute of Japan, Mino, Japan
Sungho Jeon
Affiliation:
Energy Lab, Samsung Advanced Institute of Technology, Suwon, Republic of Korea
Changhoon Jung
Affiliation:
Platform Technology Lab, Samsung Advanced Institute of Technology, Suwon, Republic of Korea
Junho Lee
Affiliation:
Platform Technology Lab, Samsung Advanced Institute of Technology, Suwon, Republic of Korea
Soohwan Sul
Affiliation:
Platform Technology Lab, Samsung Advanced Institute of Technology, Suwon, Republic of Korea
Hee-Goo Kim
Affiliation:
Platform Technology Lab, Samsung Advanced Institute of Technology, Suwon, Republic of Korea
Jai Kwang Shin
Affiliation:
Platform Technology Lab, Samsung Advanced Institute of Technology, Suwon, Republic of Korea

Abstract

An abstract is not available for this content so a preview has been provided. As you have access to this content, a full PDF is available via the ‘Save PDF’ action button.
Image of the first page of this content. For PDF version, please use the ‘Save PDF’ preceeding this image.'
Type
Abstract
Information
Microscopy and Microanalysis , Volume 24 , Supplement S1: Proceedings of Microscopy & Microanalysis 2018 , August 2018 , pp. 1712 - 1713
Copyright
© Microscopy Society of America 2018 

References

[1] Erlebacher, J., Aziz, M. J., Karma, A, Dimitrov, N. Sieradzki, K. Nature 410 2001 450–453.Google Scholar
[2] Ogata, K., Jeon, S., Ko, D.-S., et al Nature Communication accepted (2018).Google Scholar
[3] Wang, H., Wang, X., Xia, S. Chew, H. B. The Journal of Chemical Physics 143 2015 104703.Google Scholar