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In-line Holography with Single Atom Sensitivity: Challenges and Achievements

Published online by Cambridge University Press:  25 July 2016

Christian Kisielowski
Affiliation:
Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley CA 94720, USA
Petra Specht
Affiliation:
Dep. of Materials Science and Engineering, University of California, Berkeley, CA 94720, USA
Jinhui Yang
Affiliation:
Joint Center for Artificial Photosynthesis, Lawrence Berkeley National Laboratory, Berkeley 94720, USA
Ian D. Sharp
Affiliation:
Joint Center for Artificial Photosynthesis, Lawrence Berkeley National Laboratory, Berkeley 94720, USA
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Abstract

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© Microscopy Society of America 2016 

References

[1] Chen, F-R., et al, Nature Comm. DOI: 10.1038/ncomms10603, online February 18th (2016).Google Scholar
[2] Zhu, Y., et al, Angew. Chem. Int. Ed 53 (2014). p. 10723.CrossRefGoogle Scholar
[3] Kisielowski, C., et al, Phys Rev. B 88 (2013). p. 024305.CrossRefGoogle Scholar
[4] Botton, G.A., et al, Micron 68 (2015). p. 140.CrossRefGoogle Scholar
[5] Kisielowski, C. Advanced Materials 27 (2015). p. 5838.CrossRefGoogle Scholar
[6] Haber, J. A., et al, Adv. Energy Mater. 5 (2015). p. 1402307.CrossRefGoogle Scholar
[7] Work at the Molecular Foundry is supported by the Office of Science, the Office of Basic Energy Sciences, the U.S. Department of Energy under Contract No. DE-AC02-05CH11231.Google Scholar
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