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In-line Holography with Single Atom Sensitivity: Challenges and Achievements

Published online by Cambridge University Press:  25 July 2016

Christian Kisielowski ,
Petra Specht ,
Jinhui Yang  and
Ian D. Sharp
Christian Kisielowski
Affiliation:
Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley CA 94720, USA
Petra Specht
Affiliation:
Dep. of Materials Science and Engineering, University of California, Berkeley, CA 94720, USA
Jinhui Yang
Affiliation:
Joint Center for Artificial Photosynthesis, Lawrence Berkeley National Laboratory, Berkeley 94720, USA
Ian D. Sharp
Affiliation:
Joint Center for Artificial Photosynthesis, Lawrence Berkeley National Laboratory, Berkeley 94720, USA

Abstract

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Abstract
Information
Microscopy and Microanalysis , Volume 22 , Supplement S3: Proceedings of Microscopy & Microanalysis 2016 , July 2016 , pp. 848 - 849
Copyright
© Microscopy Society of America 2016 

References

References:

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[2] Zhu, Y., et al, Angew. Chem. Int. Ed 53 (2014). p. 10723.Google Scholar
[3] Kisielowski, C., et al, Phys Rev. B 88 (2013). p. 024305.Google Scholar
[4] Botton, G.A., et al, Micron 68 (2015). p. 140.CrossRefGoogle Scholar
[5] Kisielowski, C. Advanced Materials 27 (2015). p. 5838.Google Scholar
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[7] Work at the Molecular Foundry is supported by the Office of Science, the Office of Basic Energy Sciences, the U.S. Department of Energy under Contract No. DE-AC02-05CH11231.Google Scholar