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High-resolution SEM Imaging with Aberration Correction for Highly Precise Measurement of Semiconductors

Published online by Cambridge University Press:  09 April 2017

M Konno ,
Y Suzuki ,
H Inada  and
K Nakamura
M Konno
Affiliation:
Hitachi High-Technologies Corporation
Y Suzuki
Affiliation:
Hitachi High-Technologies Corporation
H Inada
Affiliation:
Hitachi High-Technologies Corporation
K Nakamura
Affiliation:
Hitachi High-Technologies Corporation

Extract

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Extended abstract of a paper presented at Microscopy and Microanalysis 2011 in Nashville, Tennessee, USA, August 7–August 11, 2011.

Type
Abstract
Information
Microscopy and Microanalysis , Volume 17 , Supplement S2 , July 2011 , pp. 930 - 931
Copyright
Copyright © Microscopy Society of America 2011