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HAADF Imaging and Low-Loss EELS Investigation of HfO2/TiN Interfaces in High-k Gate Stacks

Published online by Cambridge University Press:  01 August 2005

M P Agustin ,
L R C Fonseca ,
J H Hooker  and
S Stemmer
M P Agustin
Affiliation:
University of California,Santa Barbara
L R C Fonseca
Affiliation:
Freescale Semiconductor
J H Hooker
Affiliation:
Philips Research Leuven
S Stemmer
Affiliation:
University of California,Santa Barbara

Extract

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Extended abstract of a paper presented at Microscopy and Microanalysis 2005 in Honolulu, Hawaii, USA, July 31--August 4, 2005

Type
Research Article
Information
Microscopy and Microanalysis , Volume 11 , Issue S02 , August 2005 , pp. 1446 - 1447
Copyright
© 2005 Microscopy Society of America