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Focused Ion Beams of Xe+, Ar+, O+, and N+: Sputter Rate Trends, Chemical Interactions, and Emerging Applications

Published online by Cambridge University Press:  05 August 2019

Chad Rue ,
Jing Wang ,
Steven Randolph  and
Gavin Mitchson
Chad Rue*
Affiliation:
ThermoFisher Scientific, Advanced Technology Division, Hillsboro, OR, USA.
Jing Wang
Affiliation:
ThermoFisher Scientific, Advanced Technology Division, Hillsboro, OR, USA.
Steven Randolph
Affiliation:
ThermoFisher Scientific, Advanced Technology Division, Hillsboro, OR, USA.
Gavin Mitchson
Affiliation:
ThermoFisher Scientific, Advanced Technology Division, Hillsboro, OR, USA.
*
*Corresponding author: chad.rue@thermofisher.com

Abstract

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Type
Advances in Focused Ion Beam Instrumentation and Techniques
Information
Microscopy and Microanalysis , Volume 25 , Supplement S2 , August 2019 , pp. 860 - 861
Copyright
Copyright © Microscopy Society of America 2019 

References

[1]Stanford, M, Lewis, B and Mahdy, K, JVST B 35 (2017).Google Scholar
[2]Smith, N, Skoczylas, W, Kellogg, S, Kinion, D and Tesch, P, JVST B 24 (2006).Google Scholar
[3]ThermoFisher Scientific Electron Microscopy Solutions, https://www.fei.com/products/dualbeam/helios-nanolab/ (accessed 2/21/2019).Google Scholar
[4]Rue, C, Cold Beams Conference, Eindhoven, Netherlands (2017).Google Scholar