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Exceeding Conventional Resolution Limits in High-Resolution Transmission Electron Microscopy Using Tilted Illumination and Exit-Wave Restoration

Published online by Cambridge University Press:  06 July 2010

Sarah J. Haigh ,
Hidetaka Sawada ,
Kunio Takayanagi  and
Angus I. Kirkland
Sarah J. Haigh
Affiliation:
Department of Materials, University of Oxford, Parks Road, Oxford OX1 3PH, United Kingdom
Hidetaka Sawada
Affiliation:
JEOL Ltd., 1-2 Musashino 3-Chome, Akishima, Tokyo 196-8558, Japan
Kunio Takayanagi
Affiliation:
Department of Physics, Tokyo Institute of Technology, 2-12-1-H-51 Oh-okayama, Meguro-ku, Tokyo 152-8551, Japan CREST, Japan Science and Technology Corporation, Kawaguchi, Saitama 332-0012, Japan
Angus I. Kirkland*
Affiliation:
Department of Materials, University of Oxford, Parks Road, Oxford OX1 3PH, United Kingdom
*
Corresponding author. E-mail: angus.kirkland@materials.ox.ac.uk
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Abstract

Tilted illumination exit-wave restoration is compared for two aberration-corrected instruments at different accelerating voltages. The experimental progress of this technique is also reviewed and the significance of off-axial aberrations examined. Finally, the importance of higher order aberration compensation combined with careful correction of the lower order aberrations is highlighted.

Keywords

high resolutionelectron microscopyaberration correctionaperture synthesisexit-wave reconstruction
Type
Special Section—Aberration-Corrected Electron Microscopy
Information
Microscopy and Microanalysis , Volume 16 , Issue 4 , August 2010 , pp. 409 - 415
Copyright
Copyright © Microscopy Society of America 2010

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References

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