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Embracing Uncertainty: Modeling Uncertainty in EPMA—Part II

Published online by Cambridge University Press:  17 February 2021

Nicholas W.M. Ritchie
Nicholas W.M. Ritchie*
Affiliation:
Surface and Microanalysis Science, NIST, Gaithersburg, MD 20899, USA
*
*Author for correspondence: Nicholas W.M. Ritchie, E-mail: nicholas.ritchie@nist.gov
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Abstract

This, the second in a series of articles present a new framework for considering the computation of uncertainty in electron excited X-ray microanalysis measurements, will discuss matrix correction. The framework presented in the first article will be applied to the matrix correction model called “Pouchou and Pichoir's Simplified Model” or simply “XPP.” This uncertainty calculation will consider the influence of beam energy, take-off angle, mass absorption coefficient, surface roughness, and other parameters. Since uncertainty calculations and measurement optimization are so intimately related, it also provides a starting point for optimizing accuracy through choice of measurement design.

Keywords

compositionEPMAmatrix correctionmeasurement optimizationuncertainty
Type
Software and Instrumentation
Information
Microscopy and Microanalysis , Volume 27 , Issue 1 , February 2021 , pp. 74 - 89
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Copyright
Copyright © The Author(s), 2021. Published by Cambridge University Press on behalf of the Microscopy Society of America

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