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EELS Investigation of Al2O3 at 30 keV and below; First Results of Alumina's Structural Sensitivity to a Low-Energy Electron Beam

Published online by Cambridge University Press:  04 August 2017

Takeshi Sunaoshi
Affiliation:
Hitachi High-Technologies Corp., Application Development Department, Ibaraki, Japan.
Manabu Shirai
Affiliation:
Hitachi High-Technologies Corp., Application Development Department, Ibaraki, Japan.
Satoshi Okada
Affiliation:
Hitachi High-Technologies Corp., Electron Microscope Systems Design 1st Dept., Ibaraki, Japan.
Kazutoshi Kaji
Affiliation:
Hitachi High-Technologies Corp., Electron Microscope Systems Design 1st Dept., Ibaraki, Japan.
Edgar Voelkl
Affiliation:
Hitachi High Technologies America, NSD, Clarksburg, Maryland, USA.
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© Microscopy Society of America 2017 

References

[1] Colliex, C, Tence, M, Lefevre, E, Mory, C, Gu, H, et al, Microchim. Acta 114/115 1994 p71.CrossRefGoogle Scholar
[2] Berger, SD, Salisbury, IG, Milne, RH, Imeson, D & Humphreys, CJ Philos. Mag. B 55 1987 p341.CrossRefGoogle Scholar
[3] Bouchet, D & Colliex, C Ultramicroscopy 96 2003 139152.CrossRefGoogle Scholar
[4] Kimoto, K, Ishizuka, K, et al, Journal of Electron Microscopy 52(3 2003). pp 299303.CrossRefGoogle Scholar
[5] Sunaoshi, T, Kaji, K, Orai, Y, Schamp, CT & Voelkl, E Microsc. Microanal 22(Suppl 3 2016 p604.CrossRefGoogle Scholar
[6] Prof. Dr. R. Gauvin is thanked for his many useful discussions and contributions to this work.Google Scholar
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EELS Investigation of Al2O3 at 30 keV and below; First Results of Alumina's Structural Sensitivity to a Low-Energy Electron Beam
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EELS Investigation of Al2O3 at 30 keV and below; First Results of Alumina's Structural Sensitivity to a Low-Energy Electron Beam
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