Hostname: page-component-848d4c4894-nmvwc Total loading time: 0 Render date: 2024-06-19T15:03:36.291Z Has data issue: false hasContentIssue false
  • English
  • Français

Dual Lens Electron Holography for High Spatial Resolution Junction and Strain Mapping of Semiconductor Devices

Published online by Cambridge University Press:  27 August 2014

Y.Y. Wang  and
J. Bruley
J. Bruley
Affiliation:
IBM, Zip 40E, Hudson Valley Research Park, 2070 Route 52, Hopewell Jct., NY 12533, USA

Abstract

An abstract is not available for this content so a preview has been provided. As you have access to this content, a full PDF is available via the ‘Save PDF’ action button.
Image of the first page of this content. For PDF version, please use the ‘Save PDF’ preceeding this image.'
Type
Abstract
Information
Microscopy and Microanalysis , Volume 20 , Supplement S3: Proceedings of Microscopy & Microanalysis 2014 , August 2014 , pp. 240 - 241
Copyright
Copyright © Microscopy Society of America 2014 

References

1) Hytch, M., et al. Nature 453 (2008)1086.Google Scholar
2) Rau, W.D., et al. Physical Review Letter 82 (1999)2614.Google Scholar
3) Wang, Y.Y., et al. Ultramicroscopy 101 (2004)63.Google Scholar
4) Wang, Y.Y., et al. US patent: US 7,015,469 B2 (2006).Google Scholar
5) Wang, Y.Y., et al. JEOL News 47 (2012)9.Google Scholar
6) Wang, Y.Y., et al. Ultramicroscopy 124 (2013) 117.Google Scholar
7) Wang, Y.Y., et al. Applied Physics Letter 103 (2013)052104.Google Scholar