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Development of High Resolution FE-SEM (8"FE-SEM) For 8-Inches wafer inspection

Published online by Cambridge University Press:  02 July 2020

K. Ohara ,
C. Nielsen  and
M. Saito
K. Ohara
Affiliation:
JEOL. Ltd., 1-2 Musashino 3-chome, Akishima, Tokyo 196-8558, Japan
C. Nielsen
Affiliation:
JEOL. USA, Inc., 11 Dearborn Road, Peabody, Mass, 01960, USA
M. Saito
Affiliation:
JEOL. Ltd., 1-2 Musashino 3-chome, Akishima, Tokyo 196-8558, Japan
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Extract

Semiconductor production using 8-inches wafers seems to be widely carried out in semiconductor factories. Many FE-SEMs are coming to be used for their particle/defect inspection. As semiconductor processing turns precise, the need of a high resolution FE-SEM has been rising all the more.

Now, JEOL announces a high resolution FE-SEM (8"FE-SEM) for 8-inches wafer inspection, which takes over the strong point of the semi-in-lens field emission scanning electron microscope (FE-SEM) JSM-6340F which has been getting expensive evaluation with its high resolution performance. The 8"FE-SEM possesses a resolution of 3.0nm at lkV of its acceleration voltage and 1.2nm at 15kV, as its semi-in-lens type object lens makes it possible to minimize the aberration.

High resolution observation and inclined wafer observation can be selected properly by changing the wafer holder, as such a holder exchange system has been usually used for transmission electron microscopes.

Type
Advances in Instrumentation and Performance
Information
Microscopy and Microanalysis , Volume 4 , Issue S2: Proceedings: Microscopy & Microanalysis '98, Microscopy Society of America 56th Annual Meeting, Microbeam Analysis Society 32nd Annual Meeting, Atlanta, Georgia July 12-16, 1998 , July 1998 , pp. 406 - 407
Copyright
Copyright © Microscopy Society of America

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