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A Comparison of Current and Emerging Ion and Laser Beam Techniques for High Throughput Material Removal

Published online by Cambridge University Press:  04 August 2017

Srinivas Subramaniam
Affiliation:
Intel Corporation, Chandler, AZ, U.S.A.
Kaushik Muthur
Affiliation:
Intel Corporation, Chandler, AZ, U.S.A.
K Johnson
Affiliation:
Intel Corporation, Chandler, AZ, U.S.A.
Mclean P. Echlin
Affiliation:
Materials Department, University of California at Santa Barbara, Santa Barbara, CA, U.S.A.
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Abstract

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© Microscopy Society of America 2017 

References

[1] Subramaniam, , et al, Microscopy and Microanalysis 2014). p. 296.CrossRefGoogle Scholar
[2] Echlin, M.P., et al, Materials Characterization 100 2015). p. 1.CrossRefGoogle Scholar
[3] The authors would like to acknowledge Deepak Goyal for help with reviewing the paper.Google Scholar
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