Hostname: page-component-76fb5796d-5g6vh Total loading time: 0 Render date: 2024-04-25T11:43:26.036Z Has data issue: false hasContentIssue false

Characterizing InGaAs/GaAs quantum dots using low-kV FESEM imaging and EDS analysis at the nanometer scale

Published online by Cambridge University Press:  25 July 2016

Fang Zhou
Affiliation:
Carl Zeiss Microscopy GmbH, Carl-Zeiss-StraBe 22, 73447 Oberkochen, Germany
Luyang Han
Affiliation:
Carl Zeiss Microscopy GmbH, Carl-Zeiss-StraBe 22, 73447 Oberkochen, Germany
Simon Burgess
Affiliation:
Oxford Instruments NanoAnalysis, Halifax Road, High Wycombe, Bucks HP12 3SE, UK
Xiaobing Li
Affiliation:
Oxford Instruments NanoAnalysis, Halifax Road, High Wycombe, Bucks HP12 3SE, UK

Abstract

Image of the first page of this content. For PDF version, please use the ‘Save PDF’ preceeding this image.'
Type
Abstract
Copyright
© Microscopy Society of America 2016 

References

References:

[1] Michler, P., Kiraz, A., Becher, C., Schoenfeld, W. V., Petroff, P. M., Zhang, L., Hu, E. & Imamoglu, A. Science 290, pp. 2282 (2000).Google Scholar
[2] Burkard, G., Loss, D. & DiVincenzo, D. P. Phys. Rev. B 59, pp. 2070 (1999).Google Scholar
[3] Maniguet, L., Roussel, F., Martin, R., Djurado, E., Steil, M.C., Bichaud, E., Le Goff, A., Holzinger, M., Cosnier, S., Chaix, J.M. & Carry, C. Microscopy and Analysis, Nanotechnology Supplement Nov/Dec (pp. 4 (2015).Google Scholar