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An Atomic Renaissance For Pulsed Field Ion Microscopy

Published online by Cambridge University Press:  05 August 2019

Shyam Katnagallu
Affiliation:
Max Planck Institute für Eisenforschung, Düsseldorf, Germany
Isabelle Mouton
Affiliation:
Max Planck Institute für Eisenforschung, Düsseldorf, Germany
Felipe Oliveira
Affiliation:
Max Planck Institute für Eisenforschung, Düsseldorf, Germany
Baptiste Gault
Affiliation:
Max Planck Institute für Eisenforschung, Düsseldorf, Germany
Dierk Raabe
Affiliation:
Max Planck Institute für Eisenforschung, Düsseldorf, Germany
Leigh T. Stephenson*
Affiliation:
Max Planck Institute für Eisenforschung, Düsseldorf, Germany
*
*Corresponding author: l.stephenson@mpie.de
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Abstract

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Type
Recent Developments in Atom Probe Tomography
Copyright
Copyright © Microscopy Society of America 2019 

References

[1]Müller, EW, Panitz, JA, McLane, SB, “The Atom-Probe Field Ion Microscope”, Review of Scientific Instruments 39 (1968) p. 83.CrossRefGoogle Scholar
[2]Vurpillot, F, Gilbert, M, Deconihout, B, “Towards the three-dimensional field ion microscope”, Surface and Interface Analysis 39 (2007) p. 273.CrossRefGoogle Scholar
[3]S Koelling et al. , “Direct imaging of 3D atomic-scale dopant-defect clustering processes in ion-implanted silicon”, Nano Letters 13 (2013) p. 2458.CrossRefGoogle Scholar
[4]Seidman, DN, “Three-Dimensional Atom-Probe Tomography: Advances and Applications”, Annual Review of Materials Research 37 (2007) 127158CrossRefGoogle Scholar
[5]Åtomnaut, http://www.atomnaut.com/ (accessed February 14, 2019).Google Scholar
[6]Gault, B, Moody, MP, Cairney, JM, Ringer, SP, “Atom Probe Microscopy”, Springer New York (2012)CrossRefGoogle Scholar
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