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Advantages of Low-kV TEM in the Study of Beam Sensitive Materials

Published online by Cambridge University Press:  30 July 2020

Toshie Yaguchi ,
Jim Kilcrease ,
Keisuke Igarashi ,
Akiko Wakui  and
Keiji Tamura
Toshie Yaguchi
Affiliation:
Hitachi High-Tech Corporation, Hitachinaka-shi, Ibaraki, Japan
Jim Kilcrease
Affiliation:
Hitachi High-Tech America Inc, Clarksburg, Maryland, United States
Keisuke Igarashi
Affiliation:
Hitachi High-Tech Corporation, Hitachinaka-shi, Ibaraki, Japan
Akiko Wakui
Affiliation:
Hitachi High-Tech Corporation, Hitachinaka-shi, Ibaraki, Japan
Keiji Tamura
Affiliation:
Hitachi High-Tech Corporation, Hitachinaka-shi, Ibaraki, Japan

Abstract

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Type
Vendor Symposium - Biology
Information
Microscopy and Microanalysis , Volume 26 , Supplement S2 , August 2020 , pp. 554 - 555
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Copyright
Copyright © Microscopy Society of America 2020

References

Tamura, K., et al. , Microsc. Microanal. 24 (Suppl 1), 2018, 1156–1157.10.1017/S1431927618006268CrossRefGoogle Scholar
Igarashi, et al. , Proceeding of the 60th Battery Symposium, Japan. p.215. (2019).Google Scholar