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Microtextural Characterization and Orientational Mapping of Polycrystalline Thin Films Using TEM Dark Field Imaging Through an Annular Objective Aperture

Published online by Cambridge University Press:  02 July 2020

M. Williamson
Affiliation:
Department of Materials Science, University of Virginia, Charlottesville, VA22903
R. Hull
Affiliation:
Department of Materials Science, University of Virginia, Charlottesville, VA22903
D. Dunn
Affiliation:
Department of Materials Science, University of Virginia, Charlottesville, VA22903
J. Greene
Affiliation:
Materials Science Department and Materials Research Laboratory, University of Illinois, 104 South Goodwin Ave Urbana, IL61801
S. Kodambaka
Affiliation:
Materials Science Department and Materials Research Laboratory, University of Illinois, 104 South Goodwin Ave Urbana, IL61801

Extract

Several methods have been applied to the texture characterization of polycrystalline films, including X-ray diffraction and several SEM and TEM techniques. Few of these techniques combine high spatial resolution with the ability to characterize large sample areas in a short time. We have fabricated annular objective apertures for the TEM, extending earlier work of Heinemann and Poppa, to characterize the orientation and size of grains within polycrystalline thin films. This procedure is similar to conical dark field imaging which has been shown to provide microtextural information over large areas

Apertures were fabricated using a FEI FIB-200 focused ion beam (FIB) workstation. Bitmap templates of apertures were created using Adobe Illustrator and converted to stream files. These stream files were then used to controllably cut annular apertures into an existing platinum JEOL aperture strip with a 30 keV Ga+ FIB. The apertures were then placed in the objective aperture drive of a JEOL 2000FX transmission electron microscope and TiN thin films were imaged in bright- and dark-field imaging modes.

Type
Electron Diffraction in the TEM
Copyright
Copyright © Microscopy Society of America

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References

1.Schwarzer, R. A., Fresenius’ Journal of Analytical Chemistry, vol.361, no.6-7; (1998)522-6.CrossRefGoogle Scholar
2.Heinemann, K. and Poppa, H., Applied Physics Letters, vol.20, no.3; (1972)122-5.CrossRefGoogle Scholar
3.Harris, K.E. and King, A. H., Journal of Electronic Materials, vol.23, no.10; (1994)1035-41.CrossRefGoogle Scholar
4.Hirsch, P.B.et al., Electron Microscopy of Thin Crystals, Malabar FL, R.E. Krieger Publishing, (1977)299300.Google Scholar
5. Funding was provided by NSF/DARPA.Google Scholar

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Microtextural Characterization and Orientational Mapping of Polycrystalline Thin Films Using TEM Dark Field Imaging Through an Annular Objective Aperture
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Microtextural Characterization and Orientational Mapping of Polycrystalline Thin Films Using TEM Dark Field Imaging Through an Annular Objective Aperture
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Microtextural Characterization and Orientational Mapping of Polycrystalline Thin Films Using TEM Dark Field Imaging Through an Annular Objective Aperture
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