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Numerical studies on the properties of femtosecond laser plasma Kα sources

Published online by Cambridge University Press:  30 July 2001

CH. REICH
Affiliation:
Abteilung Röntgenoptik, Institut für Optik und Quantenelektronik, Friedrich-Schiller-Universität Jena, D-07743 Jena, Germany
P. GIBBON
Affiliation:
Abteilung Röntgenoptik, Institut für Optik und Quantenelektronik, Friedrich-Schiller-Universität Jena, D-07743 Jena, Germany
I. USCHMANN
Affiliation:
Abteilung Röntgenoptik, Institut für Optik und Quantenelektronik, Friedrich-Schiller-Universität Jena, D-07743 Jena, Germany
E. FÖRSTER
Affiliation:
Abteilung Röntgenoptik, Institut für Optik und Quantenelektronik, Friedrich-Schiller-Universität Jena, D-07743 Jena, Germany

Abstract

One of the features of ultra high intensity (UHI) short pulse laser–matter interactions is the prospect of creating a cheap, compact source of hard X rays with femtosecond pulse duration. The properties of such Kα sources are studied using analytical and numerical models of hot electron generation and subsequent transport in a range of materials (Reich et al., 2000). First, we find that there is an optimum laser intensity for Kα generation from bulk targets, which scales as Z4.4. Second, we show that efficient hard X-ray pulses with durations below 100 fs can be generated at intensities of ∼1016 W/cm2.

Type
Research Article
Copyright
© 2001 Cambridge University Press

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