Hostname: page-component-78c5997874-dh8gc Total loading time: 0 Render date: 2024-11-13T01:00:55.391Z Has data issue: false hasContentIssue false
  • English
  • Français

Excimer laser plasma to control laser pulse duration

Published online by Cambridge University Press:  09 March 2009

Qihong Lou
Qihong Lou
Affiliation:
Shanghai Institute of Optics and Fine Mechanics, Academia Sinica, P.O. Box 800–211, Shanghai, China
Get access Rights & Permissions [Opens in a new window]

Abstract

An injection-locking excimer laser beam with a pulse duration of 25 ns is focused on the surface of a polymide film. The laser beam that passes through the etching film is shorter than the original one. By optimizing the thickness of the film and the beam powerdensity, a pulse with a 3-ns pulse duration can be obtained using this switch technology.

Type
Regular Papers
Information
Laser and Particle Beams , Volume 15 , Issue 2 , June 1997 , pp. 235 - 240
Copyright
Copyright © Cambridge University Press 1997

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

Branon, J.H. et al. 1985 J. Appl. Phys. 58, 2636.CrossRefGoogle Scholar
Cheng, X. et al. 1985 Acta Optica Sinica (in Chinese) 5(7), 1643.Google Scholar
Davis, G.M. & Gower, M.C. 1987 J. Appl. Phys. 61(15), 2090.CrossRefGoogle Scholar
Deutsch, T.F. & Geiis, M.W. 1983 J. Appl. Phys 54, 721.Google Scholar
Robertson, K.L. & Avicola, K. 1990 SPIE OE/LASER'90, 14–19 Jan, Los Angeles, paper 1225–04.Google Scholar
Srinivasan, R. & Mayke, V.-B. 1982 Appl. Phys. Lett. 41, 576.CrossRefGoogle Scholar
Yomada, K. et al. 1988 IEEE J. Quant. Electron. 24 (2), 177.CrossRefGoogle Scholar