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The oxidation of an aluminum nitride powder studied by bremsstrahlung-excited Auger electron spectroscopy and x-ray photoelectron spectroscopy

Published online by Cambridge University Press:  03 March 2011

Pu Sen Wang ,
Subhas G. Malghan ,
Stephen M. Hsu  and
Thomas N. Wittberg
Pu Sen Wang
Affiliation:
Ceramics Division, National Institute of Standards and Technology, Gaithersburg, Maryland 20899
Subhas G. Malghan
Affiliation:
Ceramics Division, National Institute of Standards and Technology, Gaithersburg, Maryland 20899
Stephen M. Hsu
Affiliation:
Ceramics Division, National Institute of Standards and Technology, Gaithersburg, Maryland 20899
Thomas N. Wittberg
Affiliation:
University of Dayton Research Institute, Dayton, Ohio 45469
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Abstract

Bremsstrahlung-excited Auger electron spectroscopy (AES) was used to study the oxidation kinetics of an aluminum nitride powder oxidized in air at 750, 800, 850, and 900 °C. An equation was derived to calculate the average surface oxide film thickness from the aluminum AES spectra. The oxidation of this powder was found to follow a parabolic rate law within this temperature range. The measured activation energy was 230 ± 17 kJ/mol (55 ± 4 kcal/mol). Analysis with x-ray photoelectron spectroscopy (XPS) showed that in addition to the nitride N 1s peak, there was a second N 1s peak. This peak has been observed in previous studies and can be attributed to N-O bonding either within the growing oxide film or at the Al2O3/AlN interface.

Type
Articles
Information
Journal of Materials Research , Volume 10 , Issue 2 , February 1995 , pp. 302 - 305
Copyright
Copyright © Materials Research Society 1995

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References

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