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Effect of substrate bias voltage on the properties of arc ion-plated TiN films onto high speed steels

Published online by Cambridge University Press:  31 January 2011

Syuji Yamamoto
Affiliation:
Central Research Laboratory, Sumitomo Metal Mining Co. Ltd., 3–18–5, Nakakokubun Ichikawa, 272, Japan
Hiroshi Ichimura
Affiliation:
Central Research Laboratory, Sumitomo Metal Mining Co. Ltd., 3–18–5, Nakakokubun Ichikawa, 272, Japan
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Abstract

The effect of substrate bias voltage on the properties of arc ion-plated TiN films onto high speed steels has been investigated. The high density structure with a large crystallite size grew at the high bias voltage. TiN films deposited by higher bias exhibited strong preferential (111) orientation from XRD. The internal stress of TiN films increased at first with increasing substrate bias voltage; however, it decreased as the bias voltage increased over 100 V. The coating adhesion measured by the scratch tester increased with increasing bias voltage, and this is coupled with a cohesion of films. Cutting performance of TiN coated drills, which increased markedly with increasing substrate bias, has been studied in relation to the physical and chemical properties of deposited films.

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Articles
Copyright
Copyright © Materials Research Society 1996

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References

REFERENCES

1.Raghuram, A. C. and Bunshar, R. F., J. Vac. Sci. Technol. 9, 1389 (1972).CrossRefGoogle Scholar
2.Wang, D. and Oki, T., Thin Solid Films 185, 219 (1990).CrossRefGoogle Scholar
3.Okamoto, Y. and Kamijyo, E., Nissin Denki Gihou (Jpn.) 32, 56 (1987).Google Scholar
4.Rickerby, D. S., Eckold, G., Scott, K. T., and Buckley-Golder, I.M., Thin Solid Films 154, 125 (1987).CrossRefGoogle Scholar
5.Yamamoto, S. and Ichimura, H., J. Mater. Res. 7, 2240 (1992).CrossRefGoogle Scholar
6.Ichimura, H., Bull. Ceram. Soc. Jpn. 24, 433 (1989).Google Scholar
7.Knoteck, O., Elsing, R., Kramer, G., and Jungblut, F., Surf. Coating Technol. 46, 265 (1991).CrossRefGoogle Scholar
8.Kawana, A. and Ichimura, H., unpublished research.Google Scholar
9.Sun, R. C., Tisone, T. C., and Cruzan, P. D., J. Appl. Phys. 46, 112 (1975).CrossRefGoogle Scholar
10.Mechanical Properties of Ceramics (Ceramic Society of Japan, 1979), p. 507.Google Scholar
11.Steimann, P. A. and Hintermann, H. E., J. Vac. Sci. Technol. A 3, 2349 (1985).Google Scholar
12.Pelleg, J., Zevin, L. Z., Lungo, S., and Groitoru, N., Thin Solid Films 197, 117128 (1991).CrossRefGoogle Scholar
13.Chiba, Y. and Ichimura, H., J. Ceram. Soc. Jpn. 103, 162 (1995).CrossRefGoogle Scholar
14.Petrov, I., Hultman, L., Helmersson, U., Sundgren, J. E., and Green, J.E., Thin Solid Films 169, 299314 (1989).CrossRefGoogle Scholar
15.Perry, A. J., Thin Solid Films 107, 2397 (1985).Google Scholar
16.Valli, J., Makela, V., Matthews, A., and Murawa, V., J. Vac. Sci. Technol. A 3, 2411 (1985).CrossRefGoogle Scholar
17.Münz, W. D., J. Vac. Sci. Technol. A 4, 2717 (1986).CrossRefGoogle Scholar
18.Ichimura, H. and Kawana, A., J. Mater. Res. 8, 1093 (1993).CrossRefGoogle Scholar
19.Freller, H. and Haessler, H., Thin Solid Films 153, 67 (1987).CrossRefGoogle Scholar