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Scale-dependent nanomechanical behavior and anisotropic friction of nanotextured silicon surfaces

Published online by Cambridge University Press:  31 January 2011

Hanshen Zhang  and
Kyriakos Komvopoulos
Kyriakos Komvopoulos*
Affiliation:
Department of Mechanical Engineering, University of California, Berkeley, California 94720
*
a) Address all correspondence to this author. e-mail: kyriakos@me.berkeley.edu
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Abstract

Nanoscale surface texturing of silicon was accomplished by oblique Ar+ ion beam irradiation. Atomic force microscope (AFM) imaging showed that nanotexturing produced an anisotropic morphology consisting of ordered nanometer-sized ripples. Surface force microscope (SFM) measurements showed that the nanotextured surface exhibited scale-dependent nanomechanical behavior during indentation loading/unloading and anisotropic sliding friction, significantly different from those of the original (untextured) surface. AFM and SFM results showed a strong dependence of the nanoindentation response and friction coefficient on the tip radius and sliding direction relative to the ripple orientation. The observed experimental trends are interpreted in terms of the applied normal load, real contact area, interfacial adhesion force, tip-ripple interaction scale, and ripple orientation.

Keywords

Ion-beam processingNanoindentationTribology
Type
Articles
Information
Journal of Materials Research , Volume 24 , Issue 10 , October 2009 , pp. 3038 - 3043
Copyright
Copyright © Materials Research Society 2009

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