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Rheological evaluation of colloidal dispersions using the smoothed profile method: formulation and applications

Published online by Cambridge University Press:  03 March 2016

John J. Molina*
Affiliation:
Fukui Institute for Fundamental Chemistry, Kyoto University, Kyoto 606-8103, Japan Department of Chemical Engineering, Kyoto University, Kyoto 615-8510, Japan
Kotaro Otomura
Affiliation:
Department of Physics, University of Tokyo, Tokyo 133-0033, Japan
Hayato Shiba
Affiliation:
Institute for Solid State Physics, University of Tokyo, Chiba 277-8581, Japan
Hideki Kobayashi
Affiliation:
Theoretical Soft Matter and Biophysics, Institute for Advanced Simulation, Forschungszentrum Jülich, 52425 Jülich, Germany
Masaki Sano
Affiliation:
Department of Physics, University of Tokyo, Tokyo 133-0033, Japan
Ryoichi Yamamoto
Affiliation:
Department of Chemical Engineering, Kyoto University, Kyoto 615-8510, Japan
*
Email address for correspondence: john@cheme.kyoto-u.ac.jp

Abstract

The smoothed profile method is extended to study the rheological behaviour of colloidal dispersions under shear flow by using the Lees–Edwards boundary conditions. We start with a reformulation of the smoothed profile method, a direct numerical simulation method for colloidal dispersions, so that it can be used with the Lees–Edwards boundary condition, under steady or oscillatory-shear flow. By this reformulation, all the resultant physical quantities, including local and total shear stresses, become available through direct calculation. Three simple rheological simulations are then performed for (1) a spherical particle, (2) a rigid bead chain and (3) a collision of two spherical particles under shear flow. Quantitative validity of these simulations is examined by comparing the viscosity with that obtained from theory and Stokesian dynamics calculations. Finally, we consider the shear-thinning behaviour of concentrated colloidal dispersions.

Type
Papers
Copyright
© 2016 Cambridge University Press 

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Footnotes

Present address: Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan.

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