Article contents
X-Ray Studies of Chromium Nitride (CrxNy) Thin Films Deposited by Reactive Magnetron Sputtering
Published online by Cambridge University Press: 06 March 2019
Abstract
Chromium nitride hard coatings have been prepared by a plasma process by varying nitrogen partial pressure. The crystallographic structure of these samples has been investigated by XRD and their chemical composition and stoichiometry by Low Energy Electron Induced x-ray Spectrometry (LEEIXS).
- Type
- XI. Thin-Film and Surface Characterization by XRS and XPS
- Information
- Copyright
- Copyright © International Centre for Diffraction Data 1991
References
- 1
- Cited by