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Near-Surface-Layer Analysis by Critical Takeoff-Angle X-Ray Fluorescence Detection

Published online by Cambridge University Press:  06 March 2019

Shinjiro Hayakawa
Affiliation:
Department of Industrial Chemistry, Faculty of Engineering University of Tokyo, Hongo, Bunkyo-ku, Tokyo 113, Japan
Satoshi Sasaki
Affiliation:
Department of Industrial Chemistry, Faculty of Engineering University of Tokyo, Hongo, Bunkyo-ku, Tokyo 113, Japan
Yohichi Gohshi
Affiliation:
Department of Industrial Chemistry, Faculty of Engineering University of Tokyo, Hongo, Bunkyo-ku, Tokyo 113, Japan
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Abstract

Near-surface-layer analysis by x-ray fluorescence critical takeoff-angle detection was examined theoretically and experimentally. The takeoff-angle dependence of Cr K-L x-ray fluorescence from Cr thin films was measured with practical analyzed depth varying from several thousand to less than one hundred angstroms. Comparison of Cr K-L and K-M takeoff-angle dependence shows the analyzed depth depends on the observed x-ray energy even with identical takeoff angles. The potential of nondestructive depth profiling is also discussed.

Type
V. X-Ray Characterization of Thin Films
Copyright
Copyright © International Centre for Diffraction Data 1992

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