Hostname: page-component-848d4c4894-ndmmz Total loading time: 0 Render date: 2024-05-26T16:13:24.543Z Has data issue: false hasContentIssue false

Application of Synchrotron Radiation Excited X-Ray Fluorescence Analysis to Micro and Trace Element Determination

Published online by Cambridge University Press:  06 March 2019

Atsuo lida
Department of Industrial Chemistry, Faculty of Engineering, University of Tokyo, HongoBunkyo-ku, Tokyo 113, Japan
Yohichi Gohshi
Department of Industrial Chemistry, Faculty of Engineering, University of Tokyo, HongoBunkyo-ku, Tokyo 113, Japan
Hideki Maezawa
Photon Factory, National Laboratory for-High Energy Physics, Oho-machi, Tsukubagun, Ibaraki 305, Japan
Get access


Micro and trace element analysis by X-ray fluorescence was carried out using synchrotron radiation from a bending magnet and an undulator for hard and soft X-ray excitation respectively. The minimum detection limits obtained in the hard X-ray region were less than pg, which corresponds to a spatial resolution of less than a hundred micronmeters, with a detection limit of a few ppm. Light elements such as oxygen, nitrogen and carbon in silicon compounds were analyzed by soft X-ray emission spectroscopy using undulator radiation. The minimum detectable amount of the light elements was greatly improved, since undulator radiation is very strong in intensity, and is highly collimated.

Research Article
Copyright © International Centre for Diffraction Data 1985

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)


1. Sparks, C.J., Jr., X-Ray Fluorescence Microprobe for Chemical Analysis, in: “Synchrotron Radiation Research”, Winick, H., and Doniach, S., eds., Plenum Press, New York (1980)Google Scholar
2. Prins, M., Dries, W., Lenglet, W., Davies, S.T. and Bowen, K., Trace Element Analysis with Synchrotron Radiation at SRS Daresbury, Nucl. Instr. and Methods, B10/ll;299 (1985)Google Scholar
3. Knoechel, A., Petersen, W., and Tolkiehn, G., X-Ray Fluorescence Analysis with Synchrotron Radiation, Nucl. Instr. and Methods, 208: 659 (1983)Google Scholar
4. Jaklevic, J.M., Giauque, R.D. and Thompson, A.C., Quantitative X-Ray Fluorescence Analysis using Monochromatic Synchrotron Radiation, B10/11: 303 (1985)Google Scholar
5. Gilfrich, J.V., Skelton, E.F., Odari, S.B., Kirkland, J.P., and Nagel, D.J., Synchrotron Radiation X-ray Fluorescence Analysis, Anal. Chem., 55: 187 (1983)Google Scholar
6. Jones, K.W., Gordon, B.M., Hanson, A.L., Hastings, J.B., Howell, M.R., H. to. Kraner, and Chen, J.R., Application of Synchrotron Radiation to Elemental Analysis, Nucl. Instr. and Methods, B3;225 (1984)Google Scholar
7. Iida, A., Sakurai, K., Matsushita, T., and Gohshi, Y., Energy Dispersive X-ray Fluorescence Analysis with Synchrotron Radiation, Nucl. Instr. and Methods, 228: 556 (1985)Google Scholar
8. Horowitz, P. and Howell, J.A., A Scanning X-Ray Microscope using Synchrotron Radiation, Science, 178: 608 (1972)Google Scholar
9. Gordon, B.M. and Jones, K.W., Design Criteria and Sensitivity Calculation for Multielemental Trace Analysis at the NSLS. -Ray Microprobe, Mucl - Instr, and Methods, 0/11: 293 (1 9FS5)Google Scholar
10. Ice, G.E. and Sparks, C.J., Jr., Nucl, Instr. and Methods, Focusing Optics for a Synchrotron X-Radiation Microprobe, 222.:121 (1984)Google Scholar
11. Prins, M., Davies, S.T., and Bowen, D.K., Trace Element Analysis and Element Happing by Scanning X-Ray Fluorescence at Daresbury SRS. Nucl. Instr. and Methods, 222: 324 (1984)Google Scholar
12. Henke, B.L., Perera, R.C.C., Gullikson, E.M. and Schattenberg, M.L., High Efficiency Low-Energy X-Ray Spectroscopy in the 100 - 500 eV Region, J. Appl. Phys. 49: 480 (1978)Google Scholar
13. Iida, A., Matsushita, T., and Gohshi, Y., Energy Dispersive X-Ray Fluorescence Analysis using Synchrotron. Radiation, Adv. in X-Ray Anal. 28: 61 (1985).Google Scholar
14. Photon Factory Activity Report 1982/1983 IV-48Google Scholar
15. Maezawa, H., Suzuki, Y., Kitamura, H., and Sasaki, T., Characterization of Undulator Radiation at Photon Factory, to be published in Nucl. Instr. and Methods.Google Scholar
16. Photon Factory Activity Report 1S83/1984 V-lGoogle Scholar
17. Gilfrich, J.V., Nagel, D.J., and Barbee, T.W., Jr., Layered Synthetic Microstructure ‘ as Dispersing Devices in X-Ray Spectrometers, Appl. Spectrosc., 36: 58 (1982)Google Scholar
18. Ishikawa, T., lida, A., and Matsushita, T., to be submitted to Japan. J. Appl. Phys.Google Scholar