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9 - Phonon scattering in RHEED

Published online by Cambridge University Press:  18 January 2010

Zhong Lin Wang
Affiliation:
Georgia Institute of Technology
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Summary

Numerous inelastic scattering processes are involved in electron scattering. The mean-free-path length of inelastic scattering is about 50–300 nm for most materials, thus more than 50% of the electrons will be inelastically scattered if the specimen thickness is close to the mean-free-path length. Inelastic scattering not only affects the quality of REM images and RHEED patterns but also makes data quantification much more complex and inaccurate. In this chapter, we first outline the inelastic scattering processes in electron diffraction. Then phonon (or thermal diffuse) scattering will be discussed in detail. The other inelastic scattering processes will be described in Chapters 10 and 11.

Inelastic excitations in crystals

The interaction between an incident electron and the crystal atoms results in various elastic and inelastic scattering processes. The transition of crystal state is excited by the electron due to its energy and momentum transfers. Figure 9.1 indicates the main inelastic processes that may be excited in high-energy electron scattering. First, plasmon (or valence) excitation, which characterizes the transitions of electrons from the valence band to the conduction band, involves an energy loss in the range 1–50 eV and an angular spreading of less than 0.2 mrad for high-energy electrons. The decay of plasmons results in the emission of ultraviolet light. The cathode-luminescence (CL) technique is based on detection of the visible light emitted when an electron in a higher energy state (usually at an impurity) fills a hole in a lower state that has been created by the fast electron.

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Publisher: Cambridge University Press
Print publication year: 1996

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  • Phonon scattering in RHEED
  • Zhong Lin Wang, Georgia Institute of Technology
  • Book: Reflection Electron Microscopy and Spectroscopy for Surface Analysis
  • Online publication: 18 January 2010
  • Chapter DOI: https://doi.org/10.1017/CBO9780511525254.011
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  • Phonon scattering in RHEED
  • Zhong Lin Wang, Georgia Institute of Technology
  • Book: Reflection Electron Microscopy and Spectroscopy for Surface Analysis
  • Online publication: 18 January 2010
  • Chapter DOI: https://doi.org/10.1017/CBO9780511525254.011
Available formats
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Save book to Google Drive

To save content items to your account, please confirm that you agree to abide by our usage policies. If this is the first time you use this feature, you will be asked to authorise Cambridge Core to connect with your account. Find out more about saving content to Google Drive.

  • Phonon scattering in RHEED
  • Zhong Lin Wang, Georgia Institute of Technology
  • Book: Reflection Electron Microscopy and Spectroscopy for Surface Analysis
  • Online publication: 18 January 2010
  • Chapter DOI: https://doi.org/10.1017/CBO9780511525254.011
Available formats
×