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Resonance Photoemission at the 2p Excitation Threshold of Ni3Al

Published online by Cambridge University Press:  15 February 2011

Li-Shing HSU
Affiliation:
Department of Physics, National Chang-Hua University of Education, Chang-Hua 50058, Taiwan, ROC
K.-L. Tsang
Affiliation:
Synchrotron Radiation Research Center, Hsinchu 30077, Taiwan, ROC
S.-C. Chung
Affiliation:
Synchrotron Radiation Research Center, Hsinchu 30077, Taiwan, ROC
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Abstract

A marked resonance enhancement of the 3d photoemission intensity in angle-integrated electron-distribution curves from Ni3Al has been observed 6.6 eV below the Fermi level for photon energies in the vicinity of the Ni 2p absorption threshold. Soft x-ray L-edge absorption spectra were measured to determine the Ni 2p excitation threshold. The Fano asymmetry parameter and the effective Coulomb interaction for Ni3Al are 2.2 and 4.8 eV, respectively, as derived from the experimental data. Differences between the 2p→3d and the 3p→3d resonance effect are discussed, and comparisons with Ni, NiAl, and NiGa are made.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

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