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A Novel Molecular Beam Reactor for The Study of Diamond Surface Chemistry

Published online by Cambridge University Press:  22 February 2011

C. A. Wolden ,
G. Zau ,
W. T. Conner ,
H. H. Sawin  and
K. K. Gleason
C. A. Wolden
Affiliation:
Massachusetts Institute of Technology, 66-419, Cambridge, MA 02139
G. Zau
Affiliation:
Massachusetts Institute of Technology, 66-419, Cambridge, MA 02139
W. T. Conner
Affiliation:
Massachusetts Institute of Technology, 66-419, Cambridge, MA 02139
H. H. Sawin
Affiliation:
Massachusetts Institute of Technology, 66-419, Cambridge, MA 02139
K. K. Gleason
Affiliation:
Massachusetts Institute of Technology, 66-419, Cambridge, MA 02139
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Abstract

A novel reactor has been constructed to investigate the fundamental surface kinetics of diamond chemical vapor deposition(CVD). The molecular beam reactor permits independent control of the atomic hydrogen flux, the methyl radical flux and the substrate temperature. The low pressure in the growth chamber (≈ 1 mTorr) minimizes the impact of gas-phase chemistry. The reactive mixture impinging the substrate is sampled through an orifice and analyzed by mass spectroscopy. Differential pumping in the two adjacent chambers quenches the beam, allowing quantitative analysis of radical species such as H and CH3. In preliminary experiments deposition was achieved onto seeded molybdenum substrates.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 334: Symposium W – Gas-Phase and Surface Chemistry in Electronic Materials Processing , 1993 , 123
Copyright
Copyright © Materials Research Society 1994

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