Papers in the Appendix were published in electronic format as Volume 1534

In this series of articles, a method is presented that performs (semi)quantitative phase analysis for nanocrystalline transmission electron microscope samples from selected area electron diffraction (SAED) patterns. Volume fractions and degree of fiber texture are determined for the nanocrystalline components. The effect of the amorphous component is minimized by empirical background interpolation. First, the two-dimensional SAED pattern is converted into a one-dimensional distribution similar to X-ray diffraction. Volume fractions of the nanocrystalline components are determined by fitting the spectral components, calculated for the previously identified phases with a priori known structures. These Markers are calculated not only for kinematic conditions, but the Blackwell correction is also applied to take into account dynamic effects for medium thicknesses. Peak shapes and experimental parameters (camera length, etc.) are refined during the fitting iterations. Parameter space is explored with the help of the Downhill-SIMPLEX. The method is implemented in a computer program that runs under the Windows operating system. Part I presented the principles, while part II elaborated current implementation. The present part III demonstrates the usage and efficiency of the computer program by numerous examples. The suggested experimental protocol should be of benefit in experiments aimed at phase analysis using electron diffraction methods.

PbSe films were chemically deposited with a range of controlled microstructures, from nanocrystalline to monocrystalline films. The crystal size in the nanocrystalline films was controlled in a range 7 to 25 nm with a fairly narrow size distribution, which allowed fine-tuning of the PbSe energy gap. The optical properties of the films were investigated using infrared (IR) transmission and IR photoluminescence measurements. The nanocrystalline PbSe films showed single bandgap values in the technologically important near-IR region. Two bandgap values, corresponding to both bulk and confined nanocrystals, were obtained for films with mixed microstructure. Strong blue shifts in both the absorption and emission peaks of the nanocrystalline layers were obtained. The bandgaps of the PbSe films were found to be in good agreement with theoretical calculations. The results point out the potential of these films for nanoscale optical device applications operating in the near-IR range.

The defects in InP epitaxial structures (containing in part Pt nanoparticles) and SiGe/Si heterostructures, and their electrical behaviour are studied. In InP structures pinholes, in SiGe/Si structures misfit dislocations were observed in the epitaxial layers. These defects yielded different anomalies of the electrical behaviour, as excess and leakage currents, instabilities, anomalous temperature dependence and anomalous apparent barrier height. It is shown that inspite of anomalies, the electrical measurements provide useful and reliable information about the structures.

Lateral conductivity effects have been investigated in self-organised InAs quantum dot (QD) structures grown in a GaAs matrix with different cap layers. Current-voltage (I-V), capacitance-voltage (C-V), DLTS, capacitance and conductance frequency dependence, fast defect transient (FDT), and electron beam induced conductivity (EBIC) measurements were applied. The conductivity in the QD plane decays within a distance of 10 microns. The capacitance transients are dominated by the local QD-plane transversal conductivity and by the free carrier transport in the cap layer. The nonequilibrium free carrier created by electron beam excitation develop a potential barrier at macroscopic distances from the electrical contacts.

The effect of the defective nature of the substrate on the alloying behaviour of Xe implanted Au(55 ran)/n-GaAs system was studied using cross sectional transmission electron microscopy.

Low dose Xe implantation (700 keV, 1*1014 ions/cm2) caused the formation of about SO nm thick polycrystalline region of GaAs beneath the gold layer. Annealing the implanted sample at 450°C gold diffused through the polycrystalline GaAs region and formed large pits of Au(Ga) solid solution in the defective area of GaAs having stacking faults and twins. The formation of a regrown GaAs covering layer was observed on the top of the reacted metallization simultaneously.

High dose implantation of Xe++ ions resulted in the formation of amorphous GaAs layer with a thickness of about 750 nm. Twinned regions of GaAs were observed at the amorphous - crystalline GaAs interface by high resolution electron microscopy. Ion beam caused phase transition was observed in this sample. The amorphous GaAs region recrystallized to single crystalline GaAs due to annealing at 400°C.

The change of the doping concentration (including type) near the metal-semiconductor interface influences the Schottky barrier height (BH). In many cases this phenomenon is apparently spontaneous, or it is a side effect of the technology. The goal of this paper is to summarize the effect of the near-interface concentration change on the apparent and real Schottky BHs, and to demonstrate its importance with experimental results obtained in GaAs Schottky contacts. The question of the definition of the real BH for some of these structures is also treated.

Experimental capacitance-voltage (C-V) characteristics are presented for Au/n-GaAs Schottky contacts. The deviation of the obtained C-V characteristics from the theoretical one including the linear regions of the 1/Ca-V plot may be explained by either the normal or the lognormal lateral distribution of the barrier height. It is concluded that from physical point of view the lognormal lateral distribution of the Schottky barrier height proposed first in this work, is more likely than the normal distribution.

Schottky diodes often exhibit anomalous current-vol tage characteristics at low temperatures (T) with T dependent ideality factors (IF) and apparent barrier heights (BH) evaluated for the thermionic emission. In this paper theoretical expressions are first presented for the T dependences of the IF and the apparent BH for the thermionic-field emission (TFE) including the bias dependence of BH. Model calculations are reported, which has been performed using these expressions, and their results are compared with the available experimental data. It is shown that the T dependence of the 1 Fs and apparent BHs often may be explained self consistently by the TFE with anomalously high characteristic energies Eoo.

The electrical and interface parameters of epitaxial orthorombic, textured orthorombic, polycrystalline orthorombic, and polycrystalline hexagonal structures with different initial thickness of the evaporated Gd layer are compared. The Schottky barrier height, the ideality factor, the series resistance, the breakdown voltage, the relative interfacial layer thickness, the energy distribution spectra of interface states, and the equilibrium interface charge have been evaluated from the current-voltage and capacitance-voltage measurements. The obtained results indicate that the initial thickness of the Gd layer influences much more stronger the obtained parameters through the perfection of the epitaxial layer than the crystal structure.