A theoretical study of resolution in nanoimprint lithography (NIL) has been carried out using molecular dynamics (MD) simulation. We have performed a MD simulation for glass NIL, monitored the friction force during entire NIL process and evaluated the deformed shapes of glass patterns after the mold releasing. The resolution in NIL is governed by the maximum tensile stress acting on the glass, which is induced by the friction force during the mold releasing. Based on the distribution of average number density of atoms in the molded glass, the ultimate resolution in the glass NIL has been proved to be 0.4 nm.