We present ALMA [CII] line and far-infrared (FIR) continuum observations of seven z > 6 low-luminosity quasars (M1450 > −25 mag) discovered by our on-going Subaru Hyper Suprime-Cam survey. The [CII] line was detected in all targets with luminosities of ∼(2−10) × 108 L⊙, about one order of magnitude smaller than optically luminous quasars. Also found was a wide scatter of FIR continuum luminosity, ranging from LFIR < 1011L⊙ to ∼2 × 1012L⊙. With the [CII]-based dynamical mass, we suggest that a significant fraction of low-luminosity quasars are located on or even below the local Magorrian relation, particularly at the massive end of the galaxy mass distribution. This is a clear contrast to the previous finding that luminous quasars tend to have overmassive black holes relative to the relation. Our result is expected to show a less-biased nature of the early co-evolution of black holes and their host galaxies.

Extended abstract of a paper presented at Microscopy and Microanalysis 2004 in Savannah, Georgia, USA, August 1–5, 2004.

Extended abstract of a paper presented at Microscopy and Microanalysis 2004 in Savannah, Georgia, USA, August 1–5, 2004.

Extended abstract of a paper presented at Microscopy and Microanalysis 2004 in Savannah, Georgia, USA, August 1–5, 2004.

We have already reported that copper and calcium dipivaloylmethanates [Cu(DPM)2 and Ca(DPM)2 ] reacts selectively and stoichiometrically with surface hydroxyl groups (OH) on SiO2. In order to clarify the structure of the adsorbed species and the origin of the reaction between M(DPM)2 (M=Cu and Ca) and OH groups, the surface adsorbed species are studied by infrared spectroscopy (IR), X-ray photoelectron spectroscopy (XPS), and the extended X-ray absorption fine structure (EXAFS). As a result, it was found that H from surface OH has moved into M(DPM)2 after the adsorption, where the four oxygen coordinated structure around Cu still exists in the adsorbed Cu(DPM)2. Introducing water vapor at 673 K to this surface results in the removal of ligand DPM from the adsorbed Cu(DPM)2. At 673 K, Cu atoms decomposed from the adsorbates aggregated on the surface. This fact supports that the interaction between the adsorbed Cu(DPM)2 and SiO2 surface is originated from that between the ligands and the surface.