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Characteristics of hafnium oxide grown on silicon by atomic-layer deposition using tetrakis(ethylmethylamino)hafnium and water vapor as precursors
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- Journal:
- Journal of Materials Research / Volume 22 / Issue 7 / July 2007
- Published online by Cambridge University Press:
- 31 January 2011, pp. 1899-1906
- Print publication:
- July 2007
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- Article
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