6 results
Control of indium surface segregation in GaAs layer on InGaP grown by MOVPE
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- Journal:
- MRS Online Proceedings Library Archive / Volume 744 / 2002
- Published online by Cambridge University Press:
- 11 February 2011, M1.3
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- 2002
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In-situ monitoring of nucleation stage during aluminum-CVD for nano-structure control
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- Journal:
- MRS Online Proceedings Library Archive / Volume 697 / January 2001
- Published online by Cambridge University Press:
- 17 March 2011, P5.2
- Print publication:
- January 2001
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Structire, Properties, and Process Characteristics of Low-K Materials Prepared by PECVD
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- Journal:
- MRS Online Proceedings Library Archive / Volume 565 / 1999
- Published online by Cambridge University Press:
- 10 February 2011, 255
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- 1999
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Theoretical Reactor Design from the Simple Tubular Reactor Analysis for Wsix CVD Process
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- Journal:
- MRS Online Proceedings Library Archive / Volume 514 / 1998
- Published online by Cambridge University Press:
- 10 February 2011, 393
- Print publication:
- 1998
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Sensitive Analysis of Deposition Chemistry of Cu From (Hfac)Cu(Tmvs) Using Well Characterized Test Structure
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- Journal:
- MRS Online Proceedings Library Archive / Volume 514 / 1998
- Published online by Cambridge University Press:
- 10 February 2011, 309
- Print publication:
- 1998
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Effect of Fluorine Addition to Plasma-Enhanced Chemical Vapor Deposition Silicon Oxide Film
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- Journal:
- MRS Online Proceedings Library Archive / Volume 443 / 1996
- Published online by Cambridge University Press:
- 15 February 2011, 143
- Print publication:
- 1996
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