Please note, due to essential maintenance online transactions will not be possible between 02:30 and 04:00 BST, on Tuesday 17th September 2019 (22:30-00:00 EDT, 17 Sep, 2019). We apologise for any inconvenience.
To send content items to your account,
please confirm that you agree to abide by our usage policies.
If this is the first time you use this feature, you will be asked to authorise Cambridge Core to connect with your account.
Find out more about sending content to .
To send content items to your Kindle, first ensure firstname.lastname@example.org
is added to your Approved Personal Document E-mail List under your Personal Document Settings
on the Manage Your Content and Devices page of your Amazon account. Then enter the ‘name’ part
of your Kindle email address below.
Find out more about sending to your Kindle.
Note you can select to send to either the @free.kindle.com or @kindle.com variations.
‘@free.kindle.com’ emails are free but can only be sent to your device when it is connected to wi-fi.
‘@kindle.com’ emails can be delivered even when you are not connected to wi-fi, but note that service fees apply.
A Method for calculation of the optical and magneto-optical response of multilayered structures in which the layers are atomically thick is presented. The method can be used to calculate the response of any flim which has arbitrary compositional varaiation in the direction normal to the film plane as well. Calculations are presented for Tb/Co compositionally modulated alloys.
Amorphous hydrogenated carbon (a-C:H) thin films are of great importance in a number of industrial applications due to their hardness, chemical stability, and optical transparency. In many applications, the thickness of the a-C:H film and/or its optical properties are critical for the performance of the complete structure, and, as a result, a means of measuring these quantities is important. In this work we review the use of spectroscopic ellipsometry and transmission measurements for the estimation of the thickness and optical constants of thin a-C:H films. Spectra are shown for films exhibiting Tauc effective bandgaps ranging from 0 - 2.3 eV. The films were prepared by magnetron sputtering and plasma CVD on both silicon and glass substrates. The general energy dependence of the a-C:H optical constants is discussed in terms of the absorption processes which occur in the film.
We briefly review the optics of ellipsometry, followed by discussions of a series of example applications of the technique including single films on a substrate; multilayer stacks common to silicon integrated circuit fabrication; flat panel display materials, and in situ semiconductor growth and deposition control.
The problem of reflection of polarized light at any angle of incidence by multilayer magnetic and dielectric films is solved in specific cases by summation of reflected components, and in general by recursive application of the specific solutions. The Jones matrix convention is used to describe individual interfaces where the elements of the Jones matrix are the Fresnel coefficients for the reflecting (or transmitting) media. An explicit model, in terms of material parameters of individual films and film thicknesses, is presented for a system of n films, any of which can be magnetic or nonmagnetic. Also, limiting cases of zero magnetization and vanishing layer thicknesses are examined.
In recent years there have been reports of large magneto-optic Kerr effects (MOKE) observed in structures consisting of thin magnetic layers on top of optically thick nonmagnetic reflecting materials. Feil and Haas introduced the concept that these large MOKE could be explained in terms of
metallic plasma resonances.[l] Katayama et al found enhanced MOKE in Fe/Cu bilayers at wavelengths corresponding to the plasma edge of copper . Schoenes and Reim discussed the Feil and Haas work , and Reim and Weller demonstrated enhanced MOKE in TbFeCo/Cu at wavelengths where the optical constants n and k are small . Thus it appears that enhanced MOKE can result when materials have unusual optical dielectric functions.
The nucleation and growth of in situ doped, LPCVD silicon films was analyzed using atomic force microscopy, variable-angle spectroscopie ellipsometry, and transmission electron microscopy. The RMS surface roughness initially increases from 0.5 to 5.7 nm with increasing deposition times and then rapidly decreases to 0.5 nm for longer times. Ellipsometry data was modeled using two layers where the top layer consists of a mixture of amorphous Si plus voids and the bottom layer is a continuous amorphous Si layer. Cross-section TEM reveals the nuclei size and structure for these silicon films and confirms the results of the other techniques.
Intermetallic compounds constitute a very important class of materials for electromagnetic applications. In this article, some important materials and applications are discussed in the following areas: (1) magnetic, magnetoresistive, and magnetostrictive applications; (2) superconductor applications; (3) semiconductor and optical applications; (4) magneto-optical applications; and (5) thermoelectric applications. Emphasis is placed on materials that are important in existing devices and applications or show promise for future applications. The interested reader should consult the reviews in Westbrook and Fleischer's book, and the many references contained therein, for further information.
Email your librarian or administrator to recommend adding this to your organisation's collection.