Selective cpitaxial growth during metal-organic vapor phase epitaxy (MOVPE) can be accomplished over a wide range of growth conditions through the usC of alternative growth precursors. We have used chlorine-containing growth precursors, such as diethyl gallium chloride, (C2H5)2GaCl, to selectively grow GaAs and AlxGa1
x As. The growth process has been thermodynamically modelled in order to estimate relative growth rates and alloy composition. This model indicates that near the growth front the growth process is chemically similar to the inorganic-based growth of compound semiconductors. This growth technique has been applied to the growth of extremely low resistance ohmic contact structures and quantum well structures.