This study proposes a diary method enabled with IoT sensors for user research in design. It addresses the limitations of diary methods by incorporating sensor data to trigger user self-reports. The focus is on how sensor data influences self-reports and designers' perceptions. Results show that sensor-enabled diaries offer more diverse content and overview of users’ lives and designers perceived the proposed method potentials, suggesting significant potential for IoT in user research.

We propose a simple and practical solution to remove artificial contrast inhibiting direct interpretation of atomic arrangements in aberration-corrected TEM. The method is based on a combination of “image subtraction” for elimination of nonlinear components in images and newly improved “image deconvolution” for proper compensation of nonflat phase contrast transfer function. The efficiency of the method is shown by experimental and simulation data of typical materials such as gold, silicon, and magnesium oxide. The hypothetical results from further improvements of TEM instruments are also simulated. It is concluded that we can approach actual atomic structures by using the present method, that is, a proper combination of a Cs corrector, image subtraction, and image deconvolution processes.

Extended abstract of a paper presented at Microscopy and Microanalysis 2004 in Savannah, Georgia, USA, August 1–5, 2004.

Erbium (Er) ions were co-implanted with ytterbium (Yb) into Al0.70Ga0.30As substrates and we realized an increase in the intensity of Er intra-4f-shell luminescence. The photoluminescence (PL) intensity of Er-related dominant peak (1538.2nm) was enhanced by co-implanted Yb. The thermal quenching was improved. PL intensity of Yb-related emission was decreased. We studied the transfer energy and the optical sensitization of Yb ions co-implanted with Er ions in Al0.70Ga0.30As. Energy transfers from 2F5/2 (the first excited state) → 2F7/2 (the ground state) of Yb3+ to 4I13/2 (the first excited state) → 4I15/2 (the ground state) of Er3+ were observed by PL excitation (PLE) and selectively excited PL (SPL).

Growth and characterization of p-type 4H-SiC epitaxial layers grown on (11-20) substrates are reported. P-type 4H-SiC epilayers with smooth surface morphology have been grown on (11-20) substrates by low-pressure, hot-wall type CVD with SiH4–C3H8–H2–TMA system. The doping concentration can be controlled in the range from about 1×1016cm−3 to 1×1019cm−3. Anisotropy of the crystalline quality is observed by x-ray diffraction measurement. P-type epilayers, in which near band-gap emissions are dominated and D-A pair peak is not observed, are obtained. Hole mobility of (11-20) epilayers is smaller than that of (0001) epilayers probably due to the lack of crystalline quality compared to (0001) epilayers. The results of both low-temperature photoluminescence and the temperature dependence of Hall effect measurements indicate that the boron concentration as undoped impurity in (11-20) epilayer is lower than that of (0001) epilayer. This may be caused by the smaller incorporation efficiency of boron into (11-20) epilayer than that of (0001) epilayer.

The influence of growth conditions and susceptor purity on the residual contamination in undoped 4H-SiC epitaxial layer grown at higher temperature such as 1600 °C is investigated. Residual N concentration is found to increase with growth temperature. Growth temperature dependence of residual N concentration is stronger than that of Al or B. The effect of degradation of SiC coating layer on the purity of the epitaxial layer is studied. SiC coating layer is degraded after very few repetition of growth-run. SIMS measurement reveals that the concentration of N, Al, B, Ti and V in epitaxial layer increases with the deterioration of SiC coating layer. Therefore, serious consideration on the effect of contamination from the susceptor graphite is required. By using various grades of graphite as susceptor, the dependence of the purity of epitaxial layer on the susceptor purity is studied. High concentration (1017 to 1018 cm−3) of N is found in graphite. Contamination of all types of impurities such as p-type impurities, transition metal impurities and N in graphite is found to affect the purity of epitaxial layers.