The present work describes the selective titanium oxide formation based on electron-beam (e-beam) induced carbon deposition used as a mask against chemical dissolution. Under ideal conditions the C-deposits act as a negative resist to hinder the titanium oxide dissolution at e-beam treated locations. Carbon patterns were written in a scanning electron microscope at different electron doses on titanium oxide electrochemically grown in 1 M NaOH by potentiostatic experiments. Subsequently, the untreated areas were chemically removed in 0.5 % HF leaving the C-protected TiO2 patterns at the Ti surface. The selectivity of the technique depends on several factors such as the electron dose during masking and the chemical parameters. Under ideal conditions, it is demonstrated that direct patterning of surfaces as well as the fabrication of microstructures can be achieved using such technique.