ZnO films grown by ultrasonic spray pyrolysis with different Ga contents in the range of 1.0-6.5 at% on quartz substrates have been studied. The ZnO:Ga films were annealed at 400°C for 4h in a nitrogen flow. Morphology, emission, transmittance, absorbance and electrical resistivity were controlled. It is revealed that with a small content of Ga ≤ 4.0 at%, the ZnO:Ga films maintain a flat morphology, their transmittance increases to 86% together with the increase of the ZnO optical bandgap to 3.28 eV and the intensity enlargement of the near band edge (NBE) emission band A (3.188 eV). Furthermore, the new NBE emission band B (3.072 eV) appears in photoluminescence (PL) spectra at Ga contents ≥ 1.5 at%. Simultaneously, the process of decreasing electrical resistivity becomes saturating. The last effect is attributed to the self-compensation effect in n-type ZnO:Ga films related to the generation of acceptor type complexes (VZn2- - GaZn+). The thermal quenching of the PL intensities of the A and B PL bands is studded at 18-290K, which allows assigning the PL band A to the LO-phonon replica of the free exciton emission and the band B to the emission in donor-acceptor pairs: shallow donors - acceptor complexes (VZn2- - GaZn+). The NBE emission intensity drops and the ZnO optical bandgap demonstrates the shift to a lower energy at Ga doping up to ≤ 6.5 at%. Optimal Ga concentrations have been estimated to produce ZnO:Ga films with flat morphology, high optical transmittance and bright NBE emission.