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We developed a chemical-vapor deposition (CVD) apparatus with a 0.5×240 mm2 slit-type nozzle that scans at an area of 240×315 mm2 in the atmosphere. This apparatus forms uniform oxide crystals on substrates through the decomposition process of precursors emitted from the nozzle. In this study, ZnO whiskers were synthesized on a single-crystalline 8-inch wafer of (100)-oriented silicon using this apparatus. Morphological and crystallographic properties of the samples were evaluated using scanning electron microscopy and X-ray diffractometry.
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