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In the present paper, measurement of various plasma parameters during pulsed laser deposition of ruby thin film on quartz substrate is reported. The variation of electron temperature and ion density with laser fluence and ambient pressure is recorded via Langmuir probe technique. The structural and optical properties of ruby thin films were analyzed using photo-luminescence and atomic force microscopy, and then correlated with the plasma parameters to find optimum conditions for deposition of high quality ruby thin film.
We report utilization of the laser induced forward transfer technique to re-deposit indium thin films onto the accepter substrate using nJ laser pulses from a femtosecond laser oscillator. Keeping the accepter substrate stationary enables dots of Indium to be deposited; in contrast, linear motion of the accepter substrate facilitates deposition of lines of Indium. The effect of laser pulse energy on the deposition process is studied. The effect of translation speed of donor substrate on the laser induced forward transfer pattern is also probed and an upper limit of translation speed is established beyond which smearing is observed to occur.
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